It has high accuracy with options for auto non-uniform meshes. Lumerical FDTD is also foundry compatible and supports automated design processes with its scripting capabilities, advanced post-processing, and optimization routines.

RCWA provides fast simulations of complex multilayer stacks with surface patterning, from capturing the electric and magnetic field distributions to transmitting, reflecting, and evaluating power in each grating order.

It is ideal for rapid prototyping for thin film applications. From capturing microcavity effects and interference to handling dipole illumination and plane wave functions, STACK provides quick simulations of complex thin film multilayer stacks.

Automatically discover optimal designs and geometries for a targeted figure of merit. Discover non-intuitive geometries that optimize performance, minimize area, and improve manufacturability.

Powerful post-processing capability, including far-field projection, band structure analysis, bidirectional scattering distribution function (BSDF) generation, Q-factor analysis, and charge generation rate.

Choose from various nonlinear, negative index, and gain models. Define new material models with flexible material plug-ins.

Use multi-coefficient models for accurate material modeling over large wavelength ranges. Automatically generate models from sample data or define the functions yourself.

FDTD’s CAD environment and parameterizable simulation objects allow rapid model iterations for 2D and 3D models. It provides eye comfort with Dark Mode and is fully compatible with 4k high DPI screens and modern 3D views.

Change the position, ordering, and thickness of each layer. Simulate curved side-angled waveguides, then export the layer configuration, including material data, as a process file (.lbr) that foundries can fabricate.

Automate multiphysics simulation workflows and benefit from the state-of-the-art sensitivity analysis and optimization algorithms available in optiSLang.